4.6 Article

Production of nitric oxide using a microwave plasma torch and its application to fungal cell differentiation

期刊

出版社

IOP PUBLISHING LTD
DOI: 10.1088/0022-3727/48/19/195401

关键词

nitric oxide; microwave plasma; fungal differentiation; biological application of plasma

资金

  1. National Research Foundation of Korea (NRF) - Korean government (MSIP) [NRF-2010-0027963, 2012R1A1A2007903, NRF-2013R1A1A3011245]
  2. Agency for Defense Development through the Chemical and Biological Defense Research Center
  3. Kwangwoon University
  4. National Research Foundation of Korea [2013R1A1A3011245, 22A20130012887, 2012R1A1A2007903, 2010-0027963] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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The generation of nitric oxide by a microwave plasma torch is proposed for its application to cell differentiation. A microwave plasma torch was developed based on basic kinetic theory. The analytical theory indicates that nitric oxide density is nearly proportional to oxygen molecular density and that the high-temperature flame is an effective means of generating nitric oxide. Experimental data pertaining to nitric oxide production are presented in terms of the oxygen input in units of cubic centimeters per minute. The apparent length of the torch flame increases as the oxygen input increases. The various levels of nitric oxide are observed depending on the flow rate of nitrogen gas, the mole fraction of oxygen gas, and the microwave power. In order to evaluate the potential of nitric oxide as an activator of cell differentiation, we applied nitric oxide generated from the microwave plasma torch to a model microbial cell (Neurospora crassa: non-pathogenic fungus). Germination and hyphal differentiation of fungal cells were not dramatically changed but there was a significant increase in spore formation after treatment with nitric oxide. In addition, the expression level of a sporulation related gene acon-3 was significantly elevated after 24 h upon nitric oxide treatment. Increase in the level of nitric oxide, nitrite and nitrate in water after nitric oxide treatment seems to be responsible for activation of fungal sporulation. Our results suggest that nitric oxide generated by plasma can be used as a possible activator of cell differentiation and development.

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