期刊
ELECTROCHIMICA ACTA
卷 114, 期 -, 页码 233-241出版社
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.electacta.2013.10.009
关键词
CrN; SECM; Redox competition mode; Electrochemical behavior
资金
- National Natural Science Foundation of China [51222106]
- Program for New Century Excellent Talents in University [NCET-11-0574]
The electrochemical behavior of CrN film formed on 304 stainless steel (304 SS) by magnetron sputtering was investigated by scanning electrochemical microscopy (SECM) in redox competition mode and X-ray photoelectron spectroscopy (XPS) in 0.2 M H3BO3 + 0.05 M Na2B4O7 (pH = 8.4) buffer solution containing 3.5 wt% NaCl. The results demonstrated that passive film could form on the surface of CrN film with the chemical compositions of Cr, Cr2O3, CrN, Cr(OH)(3), and CrO3. When applied with 0.9 vs SCE/V potential, the pitting propagation sites corresponded to the high oxygen consumption region. While above stable pit, the Pt microelectrode showed an enhanced faradic current. Separated anodes and cathodes were observed in the scratch, which suggested that the dominant corrosion mechanism is pitting corrosion induced and promoted by galvanic corrosion. These results provide a more explicit description of the corrosion mechanism and processes of CrN film. (C) 2013 Elsevier Ltd. All rights reserved.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据