期刊
ELECTROCHIMICA ACTA
卷 56, 期 13, 页码 4717-4723出版社
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.electacta.2011.01.124
关键词
Thin nanolayer films; Amorphous Si/C; Magnetron sputtering; Li-ion batteries; Anode
资金
- DOE-BATT [DE-AC02-05CHI1231]
- National Science Foundation (NSF-CBET)
- Ford Motor Company
- Edward R. Weidlein Chair Professorship funds
- Center for Complex Engineered Multifunctional Materials (CCEMM)
- Directorate For Engineering
- Div Of Chem, Bioeng, Env, & Transp Sys [0933141] Funding Source: National Science Foundation
The buffering effect of carbon on the structural stability of amorphous silicon films, used as an anode for lithium ion rechargeable batteries, has been studied during long term discharge/charge cycles. To this extent, the electrochemical performance of a prototype material consisting of amorphous Si thin film (similar to 250 nm) deposited by radio frequency magnetron sputtering on amorphous carbon (similar to 50 nm) thin films, denoted as a-C/Si, has been investigated. In comparison to pure amorphous Si thin film (a-Si) which shows a rapid fade in capacity after 30 cycles, the a-C/Si exhibits excellent capacity retention displaying similar to 0.03% fade in capacity up to 50 cycles and similar to 0.2% after 50 cycles when cycled at a rate of 100 mu A/cm(2) (similar to C/2) suggesting that the presence of thin amorphous C layer deposited between the Cu substrate and a-Si acts as a buffer layer facilitating the release of the volume induced stresses exhibited by pure a-Si during the charge/discharge cycles. This structural integrity combined with microstructural stability of the a-C/Si thin film during the alloying/dealloying process with lithium has been confirmed by scanning electron microscopy (SEM) analysis. The buffering capacity of the thin amorphous carbon layer lends credence to its use as the likely compliant matrix to curtail the volume expansion related cracking of silicon validating its choice as the matrix for bulk and thin film battery systems. (C) 2011 Elsevier Ltd. All rights reserved.
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