期刊
ELECTROCHIMICA ACTA
卷 56, 期 16, 页码 5545-5553出版社
PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.electacta.2011.03.102
关键词
Platinum; Monolayer; Underpotential deposition; Surface limited redox replacement; Kinetics
资金
- National Science Foundation, Division of Electrical, Communications and Cyber Systems [NSF ECCS-0824215]
- American Chemical Society [PRF-47849-G5]
- Div Of Electrical, Commun & Cyber Sys
- Directorate For Engineering [0824215] Funding Source: National Science Foundation
The study of the kinetics of metal deposition via surface limited red-ox replacement of underpotentially deposited metal monolayers is presented. The model system was Pt submonolayer deposition on Au(1 1 1) via red-ox replacement of Pb and Cu UPD monolayers on Au(1 1 1). The kinetics of a single replacement reaction was studied using the formalism of the comprehensive analytical model developed to fit the open circuit potential transients from deposition experiments. The practical reaction kinetics parameters like reaction half life, reaction order and reaction rate constant are determined and discussed with their relevance to design and control of deposition experiments. The effects of transport limitation and the role of the anions/electrolyte on deposition kinetics are investigated and their significance to design of effective deposition process is discussed. (C) 2011 Elsevier Ltd. All rights reserved.
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