期刊
DIAMOND AND RELATED MATERIALS
卷 50, 期 -, 页码 91-96出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.diamond.2014.08.009
关键词
Diamond-like carbon; Plasma CVD; Etching; High resolution electron microscopy
类别
资金
- MEXT KAKENHI [22110515, 24110719]
- Kochi University of Technology
- Grants-in-Aid for Scientific Research [22110515, 24110719] Funding Source: KAKEN
Using a versatile atmospheric-pressure helium plasma jet, diamond-like carbon (DLC) films were etched in ambient air. We observed that the DLC films are etched at a nominal rate of around 60 nm/min in the treated area (230 mu m in diameter) during a 20-min exposure. The etching rate increased after the initial 10-min exposure. During this period, the flat DLC surface was structurally modified to produce carbon nanostructures with a density of similar to 2.4 x 10(11) cm(-2). With this increase in surface area, the etching rate increased. After 20 min, the DLC film had a circular pattern etched into it down to the substrate where silicon nanostructures were observed with sizes varying from 10 nm to 1 mu m. The initial carbon nanostructure formation is believed to involve selective removal of the sp(2)-bonded carbon domains. The carbon etching results from the formation of reactive oxygen species in the plasma. (C) 2014 Elsevier B.V. All rights reserved.
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