Synthesis of carbon nanowalls by plasma-enhanced chemical vapor deposition in a CO/H2 microwave discharge system

Synthesis of carbon nanowalls was performed by a plasma-enhanced chemical vapor deposition in a CO/H-2 microwave discharge system. At the optimum CO/H-2 feed ratio of 46 sccm/4 scan. the aligned carbon nanowalls with thickness of about several tens of nanometers were able to be synthesized. The extremely high growth rate of 1 mu m min(-1) was obtained in our system with a relatively low microwave discharge power of 60W for a growth area of 1 cm(2). An optical emission spectroscopy was performed to clarify the characteristics of a CO/H-2 discharge system. (C) 2011 Elsevier B.V. All rights reserved.