期刊
DIAMOND AND RELATED MATERIALS
卷 17, 期 2, 页码 185-189出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/j.diamond.2007.12.003
关键词
alumina film; atomic layer deposition (ALD); fluidized bed reactor
Ultra-thin alumina films are successfully deposited on primary micron-sized diamond particles in a scalable fluidized bed reactor. The studies of fluidization at reduced pressure show that micron-sized diamond particles can ben fluidized with the assistance of vibration. Alumina films are grown at 177 degrees C by atomic layer deposition (ALD) using sequential exposures of Al(CH3)(3) and H2O. The deposited alumina films are characterized by X-ray photoelectron spectroscopy, transmission and scanning electron microscopy, inductively coupled plasma-atomic emission spectroscopy, and Surface area. The results indicate that the alumina films are conformally coated on the primary diamond particle surface, and the growth rate of alumina is 0.12 nm per coating cycle. (C) 2007 Elsevier B.V. All rights reserved.
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