4.7 Article

Ru cyclooctatetraene precursors for MOCVD

期刊

DALTON TRANSACTIONS
卷 41, 期 6, 页码 1678-1682

出版社

ROYAL SOC CHEMISTRY
DOI: 10.1039/c1dt11454a

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资金

  1. World Premier International Research Center Initiative (WPI) [18065017, 19205009, 23655053]
  2. Ministry of Education, Culture, Sports, Science and Technology (MEXT), Japan
  3. CREST Type, Development of the Foundation for Nano-Interface Technology from JST, Japan
  4. Grants-in-Aid for Scientific Research [23655053, 19205009] Funding Source: KAKEN

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A series of Ru-0 cyclooctatetraene complexes are presented with optimal properties for MOCVD (metal organic chemical vapour deposition) applications, including combinations of the two lowest melting points and lowest decomposition temperatures yet reported for such materials. The compounds are easy to handle and lead to highly conformal thin films of Ru on SiO2 features; even within holes with aspect ratios of 40 : 1. SEM, AFM and XPS studies confirm the near ideal nature of the resulting

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