Growth of iron cobalt oxides by atomic layer deposition

Thin films of iron cobalt oxides with spinel-type structure are made by the atomic layer deposition (ALD) technique using Fe(thd)(3) (Hthd = 2,2,6,6- tetramethylheptane-3,5-dione), Co(thd) 2, and ozone as precursors. Pulse parameters for ALD-type growth are established and such growth can be achieved at deposition temperatures between 185 and 310 degrees C. Films have been deposited on amorphous soda-lime glass and single-crystalline substrates of Si( 100), MgO( 100), and alpha-Al2O3( 001) which all provide crystalline films, but with various orientations and crystallite sizes. Application of an external magnetic field during the film growth does not influence film growth characteristics ( growth rate, crystallinity, topography etc.). Magnetization data are reported for phase-pure films of spinel-type structure with composition Fe2CoO4.