4.4 Article

Surface analysis of GeC prepared by reactive pulsed laser deposition technique

期刊

CURRENT APPLIED PHYSICS
卷 11, 期 3, 页码 547-550

出版社

ELSEVIER SCIENCE BV
DOI: 10.1016/j.cap.2010.09.011

关键词

Germanium carbide; Reactive pulse laser deposition; Thin films; XPS; Ellipsometry

向作者/读者索取更多资源

Amorphous germanium carbide (a-Ge(1-x)C(x)) thin films were prepared by reactive pulsed laser deposition technique using several methane pressures. Surface analysis was performed by X-ray photoelectron spectroscopy (XPS) to examine the composition and elemental bonding at the surface of the material. Optical analysis was carried out by spectroscopic ellipsometry to study the optical constants (n and k) and other parameters of the film. Results indicate that the carbon atoms to be incorporated in the germanium lattice, forming a-Ge(1-x)C(x) alloy, for concentrations below about 10 atomic % where the Ge atoms are uniformly distributed. There is formation of graphitic agglomerates for higher carbon concentrations. (C) 2011 Elsevier B.V. All rights reserved.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.4
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据