4.7 Article

High-throughput fabrication of large-scale highly ordered ZnO nanorod arrays via three-beam interference lithography

期刊

CRYSTENGCOMM
卷 15, 期 42, 页码 8416-8421

出版社

ROYAL SOC CHEMISTRY
DOI: 10.1039/c3ce41558a

关键词

-

资金

  1. National Major Research Program of China [2013CB932602]
  2. Program of International ST Cooperation [2012DFA50990]
  3. NSFC [51232001, 51172022, 50972011]
  4. Fundamental Research Funds for the Central Universities
  5. Program for Changjiang Scholars and Innovative Research Team in University
  6. Beijing Novel Program [2008B19]
  7. Program for New Century Excellent Talents [NCET-09-0219]

向作者/读者索取更多资源

Large-scale highly ordered ZnO nanorod arrays with precise period control and uniform distribution are easily fabricated via three-beam interference lithography, top anti-reflective coating and hydrothermal synthesis. This new method demonstrates an efficient way to fabricate large-scale highly ordered semiconductor nanorod arrays and could meet the needs of nanomaterial design, nanodevice optimization and nanosystem integration.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.7
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据