Alkali ratio control for lead-free piezoelectric thin films utilizing elemental diffusivities in RF plasma

High performance piezoelectric thin films are generally lead-based, and find applications in sensing, actuation and transduction in the realms of biology, nanometrology, acoustics and energy harvesting. Potassium sodium niobate (KNN) is considered to be the most promising lead-free alternative, but it is hindered by the inability to control and attain perfect stoichiometry materials in the thin film form while using practical large area deposition techniques. In this work, we identify the contribution of the elemental diffusivities in the radio frequency (RF) plasma in determining the alkali loss in the KNN thin films. We have also examined the effect of the substrate temperature during the RF magnetron sputtering deposition on the crystal structure of the substrate and KNN thin films, as well as the effect of the post-annealing treatments. These results indicate the need for well-designed source materials and the potential to use the deposition partial pressure to alter the dopant concentrations.