4.2 Review

Progress of graphene growth on copper by chemical vapor deposition: Growth behavior and controlled synthesis

期刊

CHINESE SCIENCE BULLETIN
卷 57, 期 23, 页码 2995-2999

出版社

SCIENCE PRESS
DOI: 10.1007/s11434-012-5335-4

关键词

graphene; controlled growth; chemical vapor deposition; copper substrate

资金

  1. National Natural Science Foundation of China [51102241]
  2. State Key Laboratory of Robotics [RLO201012]

向作者/读者索取更多资源

Recently, chemical vapor deposition (CVD) on copper has been becoming a main method for preparing large-area and high- quality monolayer graphene. In this paper, we first briefly introduce the preliminary understanding of the microstructure and growth behavior of graphene on copper, and then focus on the recent progress on the quality improvement, number of layers control and transfer-free growth of graphene. In the end, we attempt to analyze the possible development of CVD growth of graphene in future, including the controlled growth of large-size single-crystal graphene and bilayer graphene with different stacking orders.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

4.2
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据