4.5 Article

Physical Vapor Deposition of [EMIM][Tf2N]: A New Approach to the Modification of Surface Properties with Ultrathin Ionic Liquid Films

期刊

CHEMPHYSCHEM
卷 9, 期 15, 页码 2185-2190

出版社

WILEY-V C H VERLAG GMBH
DOI: 10.1002/cphc.200800300

关键词

ionic liquids; physical vapor deposition; surface chemistry; thin films; X-ray photoelectron spectroscopy

资金

  1. DFG through SPP 1191 [STE 620/7-1, WA 1615/8-1]
  2. Excellence Cluster
  3. University of Erlangen Nuremberg

向作者/读者索取更多资源

Ultrathin films of the ionic liquid (IL) 1-ethyl-3-methylimidazolium bis(trifluoromethylsulfonyl)imide, [EMIM][Tf2N], are prepared on a glass substrate by means of an in situ thermal-evaporation/condensation process under ultrahigh-vacuum conditions. By using X-ray photoelectron spectroscopy (XPS), it is demonstrated that the first layer of the IL film grows two dimensionally, followed by the three-dimensional growth of successive layers. The first molecular layer consists of a bilayer, with the [EMIM](+) cations in contact to the surface and the [Tf2N](-) anions at the vacuum side. The ultrathin IL films are found to be stable under ambient conditions.

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