4.7 Article

Effects of cadmium on plant growth and physiological traits in contrast wheat recombinant inbred lines differing in cadmium tolerance

期刊

CHEMOSPHERE
卷 77, 期 11, 页码 1620-1625

出版社

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.chemosphere.2009.08.062

关键词

Cadmium (Cd); Anti-oxidative enzymes; Chlorophyll a fluorescence; Total soluble sugars; Free amino acids

资金

  1. National Natural Science Foundation of China [30671216, 30700483]
  2. Natural Science Foundation of Jiangsu Province [BK2008329]
  3. SRFDP [20050307006]
  4. NCET [060493]
  5. Modern Agro-industry Technology Research System

向作者/读者索取更多资源

Four wheat (Triticum aestivum L) lines differing in cadmium (Cd) tolerance previously identified from a recombinant inbred line population were subjected to 50 mu M CdCl2 from the three-leaf stage for 24 cl, to investigate the responses of wheat seedlings to Cd toxicity. Under Cd stress, most growth parameters and root morphological traits were reduced, except for secondary root numbers and average root diameter. Cd enhanced leaf cell peroxidation due to increased malondialdehyde (MDA) content and reduced activities of superoxide dismutase (SOD) and catalase (CAT) in leaves. In addition, CAT activity decreased in the Cd-sensitive lines while increased in the tolerant lines. Leaf photosystem II (PSII) was damaged, since the maximum efficiency of PSII photochemistry (Fv/Fm) and potential efficiency of PSII photochemistry under dark-adapted (Fv/Fo) decreased, while the initial fluorescence (Fo) increased in all lines under Cd stress. Then, total soluble sugar concentration decreased while free amino acids concentration increased in both shoot and root. We concluded that Cd-tolerant lines accumulated less Cd in plant and contained low Cd concentration in shoot (less translocation of Cd to shoot), maintained higher CAT activity in leaf and higher PS II function than the Cd-sensitive lines under Cd toxicity, thus could be related to their tolerant capacity to Cd in the present study. Crown Copyright (C) 2009 Published by Elsevier Ltd. All rights reserved.

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