期刊
CHEMISTRY-AN ASIAN JOURNAL
卷 7, 期 9, 页码 2139-2144出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/asia.201200383
关键词
carbon nitride; mesoporous materials; phenol; photochemistry; polymerization
资金
- Ministry of Higher Education (MOHE, Malaysia)
- Universiti Teknologi Malaysia (UTM, Malaysia) [R.J130000.7826.4F002, Q.J130000.2526.00H30]
- MOHE
A urea precursor was used for the first time to prepare mesoporous carbon nitride (MCN) by a thermal polymerization process with silica nanospheres as a hard template. Although the prepared MCN samples have similar structures and optical properties, it was revealed that the specific surface area, pore-size distribution, and morphology of the MCN samples depend on the initial mass ratio of urea to silica. Compared to the bulk carbon nitride (BCN) that only gave 20?% phenol removal (6 h of irradiation), the activities can be enhanced up to 74?% on MCN samples for photocatalytic removal of phenol under visible-light irradiation. The highest conversion was obtained on MCN with an initial mass ratio of urea to silica of 5, which has high surface area of 191 m2?g-1 and a nanoporous structure with uniform pore-size distribution of 7 nm. In addition to the high activity, the MCN sample also showed high photocatalytic stability.
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