相关参考文献
注意:仅列出部分参考文献,下载原文获取全部文献信息。Two-Photon Acid Generation Systems Based on Dibenzylidene Ketone Dyes Intermolecular Sensitization
Hao Yuan et al.
CHEMISTRY OF MATERIALS (2012)
Photoinitator surface segregation induced instabilities from polymerization of a liquid coating on a rigid substrate
Jessica M. Torres et al.
SOFT MATTER (2012)
Light-controlled quick switch of adhesion on a micro-arrayed liquid crystal polymer superhydrophobic film
Chao Li et al.
SOFT MATTER (2012)
Photoacid generator formation for the selective enrichment of perfluoroalkyl sulfonates and their direct analysis by MALDI-TOF-MS
Dong Cao et al.
ANALYST (2011)
Solid-state photoelectron transfer in powdery nanocomposites comprised of a sensitiser, photoacid generators and silica nanoparticles
Kunihiro Ichimura et al.
PHYSICAL CHEMISTRY CHEMICAL PHYSICS (2011)
Reducing the Cost, Smell, and Toxicity of the Barton Reductive Decarboxylation: Chloroform as the Hydrogen Atom Source
Eun Jung Ko et al.
ORGANIC LETTERS (2011)
Multiresponsive polymers: nano-sized assemblies, stimuli-sensitive gels and smart surfaces
George Pasparakis et al.
POLYMER CHEMISTRY (2011)
Photoacid generators (PAGs) based on N-acyl-N-phenylhydroxylamines for carboxylic and sulfonic acids
Mohammed Ikbal et al.
TETRAHEDRON (2011)
Novel Organosilicate Polymer Resists for High Resolution E-Beam Lithography
Jae Hwan Sim et al.
CHEMISTRY OF MATERIALS (2010)
Catalytic and Autocatalytic Mechanisms of Acid Amplifiers for Use in EUV Photoresists
Seth A. Kruger et al.
CHEMISTRY OF MATERIALS (2010)
UV-triggered encapsulation and release from polyelectrolyte microcapsules decorated with photoacid generators
Hye Young Koo et al.
JOURNAL OF MATERIALS CHEMISTRY (2010)
Non-ionic photo-acid generators for applications in two-photon lithography
Lorenz Steidl et al.
JOURNAL OF MATERIALS CHEMISTRY (2009)
DL-FIND: An Open-Source Geometry Optimizer for Atomistic Simulations
Johannes Kaestner et al.
JOURNAL OF PHYSICAL CHEMISTRY A (2009)
i-Line sensitive photoacid generators for UV curing
Masamitsu Shirai et al.
PROGRESS IN ORGANIC COATINGS (2009)
The Barton ester free-radical reaction: a brief review of applications
Mauricio F. Saraiva et al.
TETRAHEDRON (2009)
Acid-labile, chain-scission polymer systems used as positive-tone photoresists developable in supercritical CO2
Nelson Felix et al.
CHEMISTRY OF MATERIALS (2008)
Incorporation of ionic photoacid generator (PAG) and base quencher into the resist polymer main chain for sub-50 nm resolution patterning
Mingxing Wang et al.
JOURNAL OF MATERIALS CHEMISTRY (2008)
Fabrication of highly ordered microporous thin films by PS-b-PAA self-assembly and investigation of their tunable surface properties
Chengyin Wang et al.
JOURNAL OF MATERIALS CHEMISTRY (2008)
Photochemistry of naphthalimide photoacid generators
Jean-Pierre Malval et al.
JOURNAL OF PHYSICAL CHEMISTRY A (2008)
Effect of microstructure and chemical composition on dynamic factor of high strength steels
J. Qu et al.
MATERIALS SCIENCE AND TECHNOLOGY (2008)
Superhydrophobicity of polytetrafluoroethylene thin film fabricated by pulsed laser deposition
H. Y. Kwong et al.
APPLIED SURFACE SCIENCE (2007)
Arylonium photoacid generators containing environmentally compatible aryloxyperfluoroalkanesulfonate groups
Ramakrishnan Ayothi et al.
CHEMISTRY OF MATERIALS (2007)
Density functional theory with dispersion corrections for supramolecular structures, aggregates, and complexes of (bio)organic molecules
Stefan Grimme et al.
ORGANIC & BIOMOLECULAR CHEMISTRY (2007)
Large-scale photochemical reactions of nanocrystalline suspensions: A promising green chemistry method
Marcel Veerman et al.
ORGANIC LETTERS (2006)
Photochemical modification and patterning of polymer surfaces by surface adsorption of photoactive block copolymers
F Pan et al.
LANGMUIR (2005)
Negative-working photoresist based on a first-generation dendrimer consisting of 4,4-diphenylpentyloxy units
Y Kamimura et al.
JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY (2005)
Latent reactive groups unveiled through equilibrium dynamics and exemplified in crosslinking during film formation from aqueous polymer colloids
DJ Berrisford et al.
CHEMICAL COMMUNICATIONS (2005)
Abilities of 1-(9-anthrylmethyloxy)-2-pyridone and related compounds to initiate radical and cationic photopolymerizations
K Tanaka et al.
JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY (2004)
Photochemistry of N-isopropoxy-substituted 2(1H)-pyridone and 4-p-tolylthiazole-2(3H)-thione:: Alkoxyl-radical release (spin-trapping, EPR, and transient spectroscopy) and its significance in the photooxidative induction of DNA strand breaks
W Adam et al.
JOURNAL OF ORGANIC CHEMISTRY (2002)
A new positive-type photosensitive alkaline-developable alicyclic polyimide based on poly(amic acid silylester) as a polyimide precursor and diazonaphthoquinone as a photosensitive compound
Y Watanabe et al.
CHEMISTRY OF MATERIALS (2002)
Polymers as sulfonic acid generator on irradiation at 146 nm
T Shinozuka et al.
EUROPEAN POLYMER JOURNAL (2001)
Laser flash photolysis study of two aromatic N-oxyimidosulfonate photoacid generators
F Ortica et al.
CHEMISTRY OF MATERIALS (2000)