期刊
CHEMISTRY OF MATERIALS
卷 25, 期 9, 页码 1905-1911出版社
AMER CHEMICAL SOC
DOI: 10.1021/cm400562u
关键词
atomic layer deposition; platinum; nucleation; nanoparticles; thin film; nanopatterning
资金
- NanoNextNL, a micro and nanotechnology programme of the Dutch ministry of economic affairs, agriculture and innovation (ELI)
- Technology Foundation STW through the VICI program on Nanomanufacturing
Control of the nucleation behavior during atomic layer deposition (ALD) of metals is of great importance for the deposition of metallic thin films and nanoparticles, and for nanopatterning applications. In this work it is established for Pt ALD, that the exposure to O-2 during the O-2 pulse of the ALD process is the key parameter controlling the nucleation behavior. The O-2 dependence of the Pt nucleation is explained by the enhanced diffusion of Pt species in the presence of oxygen, and the resulting faster aggregation of Pt atoms in metal clusters that catalyze the surface reactions of ALD growth. Moreover, it is demonstrated that the O-2 exposure can be used as the parameter to tune the nucleation to enable (i) deposition of ultrathin films with minimal nucleation delay, (ii) preparation of single element or core/shell nanoparticles, and (iii) nanopatterning of metallic structures based on area-selective deposition.
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