期刊
CHEMISTRY OF MATERIALS
卷 25, 期 14, 页码 2759-2766出版社
AMER CHEMICAL SOC
DOI: 10.1021/cm400719z
关键词
hierarchical zeolite; fluoride etching; xylene isomerization
资金
- French Agence Nationale de la Recherche (ANR) [ANR 2010 BLAN 723 1]
- Lower Normandy Region
Chemical etching with fluoride ions is a new approach for secondary porosity engineering of aluminosilicate zeolite frameworks. We show that diluted HF solutions extract preferentially aluminum from zeolite frameworks. The Bronsted acidity of ZSM-5 treated in such a way decreases, while its structure is unaffected after an HF treatment. With higher HF concentrations, the number of undissociated HF molecules and the concentration of HF2- ions, extracting indiscriminately Al and Si, increase. The addition of NH4F shifts the chemical equilibria to produce more HF2-, avoiding the use of highly concentrated HF solutions; it also suppresses HF dissociation. The etching selectivity of such solutions is concentration-independent and extracts indiscriminately both framework Si and Al. Zeolite dissolution in NH4F-HF solutions starts preferentially at small intergrowth domains and goes deeply in the crystals without a substantial increase of the external surface area. Macropores are produced without altering zeolite acidity. Hierarchical materials obtained by these two approaches are characterized extensively by complementary methods and the catalytic impact illustrated in the m-xylene conversion.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据