期刊
CHEMISTRY OF MATERIALS
卷 25, 期 9, 页码 1769-1774出版社
AMER CHEMICAL SOC
DOI: 10.1021/cm400274n
关键词
atomic layer deposition (ALD); platinum; room-temperature; temperature-sensitive surfaces
资金
- NanoNextNL, a micro and nanotechnology programme of the Dutch ministry of economic affairs, agriculture and innovation (ELI)
- Technology Foundation STW through the VICI program on Nanomanufacturing
- Marie Curie IEF (ALD4PV) [FP7-MC-IEF-272444]
Plasma-assisted atomic layer deposition (ALD) processes were developed for the deposition of platinum films at room temperature. High-quality, virtually pure films with a resistivity of 18-24 mu Omega cm were obtained for processes consisting of MeCpPtMe3 dosing, O-2 plasma exposure, and H-2 gas or H-2 plasma exposure. The H-2 pulses were used to reduce the PtOx that is otherwise deposited at low substrate temperatures. It is shown that the processes enable the deposition of Pt on polymer, textile, and paper substrates, which is a significant result as it demonstrates the broad application range of Pt ALD, including applications involving temperature-sensitive materials.
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