期刊
CHEMICAL VAPOR DEPOSITION
卷 18, 期 4-6, 页码 89-101出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/cvde.201200048
关键词
Doped TiO2; Functional materials; N-TiO2; Semiconductor doping; TiO2; Titania
资金
- EPSRC [EP/E026141/1] Funding Source: UKRI
- Engineering and Physical Sciences Research Council [EP/E026141/1] Funding Source: researchfish
This review focuses on the formation of doped titanium dioxide films by CVD. It describes a number of the functional applications of titanium dioxide films, and illustrates how these properties can be improved or modified by the introduction of anion and cation dopants. It details some of the underlying theory and looks at how density of states diagrams can be used to explain the doped film properties.
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