3.9 Review

CVD Production of Doped Titanium Dioxide Thin Films

期刊

CHEMICAL VAPOR DEPOSITION
卷 18, 期 4-6, 页码 89-101

出版社

WILEY-V C H VERLAG GMBH
DOI: 10.1002/cvde.201200048

关键词

Doped TiO2; Functional materials; N-TiO2; Semiconductor doping; TiO2; Titania

资金

  1. EPSRC [EP/E026141/1] Funding Source: UKRI
  2. Engineering and Physical Sciences Research Council [EP/E026141/1] Funding Source: researchfish

向作者/读者索取更多资源

This review focuses on the formation of doped titanium dioxide films by CVD. It describes a number of the functional applications of titanium dioxide films, and illustrates how these properties can be improved or modified by the introduction of anion and cation dopants. It details some of the underlying theory and looks at how density of states diagrams can be used to explain the doped film properties.

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