3.9 Article

Stoichiometry of Nickel Oxide Films Prepared by ALD

期刊

CHEMICAL VAPOR DEPOSITION
卷 17, 期 7-9, 页码 177-+

出版社

WILEY-BLACKWELL
DOI: 10.1002/cvde.201004300

关键词

-

资金

  1. German Science Foundation via the DFG (Hamburg) [NI 616/11-1]
  2. German Science Foundation via the DFG (Halle) [HE 2100/8-1]

向作者/读者索取更多资源

Communication: Nickel oxide films obtained from nickelocene and ozone by atomic layer deposition at 230 degrees C are substoichiometric, but have the crystal structure of NiO. Oxygen can be driven out of the solid by annealing under inert atmosphere, or added into it via aerobic annealing.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

3.9
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据