期刊
CHEMICAL VAPOR DEPOSITION
卷 14, 期 11-12, 页码 347-352出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/cvde.200800710
关键词
Aluminum oxide; Atomic layer deposition; Iridium; Porous metals; Reactor comparison
资金
- Academy of Finland [115601, 201564, 209739]
- Academy of Finland (AKA) [115601, 209739, 201564, 209739, 115601, 201564] Funding Source: Academy of Finland (AKA)
The potential of atomic layer deposition (ALD) in the coating of highly porous, 0.5 mm thick, metal fiber matrices is explored. Three different reactor types are compared for ALD of Al2O3 thin films from trimethylaluminum and water. Both an evacuation-type and a flow-type process are successful in forming conformal Al2O3 coatings on the fibers. The coatings are able to protect the fibers against electrochemical corrosion and thermal oxidation. In addition, a metallic Ir thin film is deposited by ALD on one of the Al2O3-coated fiber matrices. This kind of a structure could be used, for example, as a catalytic filter.
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