期刊
CHEMICAL ENGINEERING RESEARCH & DESIGN
卷 92, 期 10, 页码 1907-1914出版社
ELSEVIER
DOI: 10.1016/j.cherd.2013.12.015
关键词
UV (Ultraviolet)/H2O2; Advanced oxidation; Flue gas; NO; SO2; NaOH
资金
- National Natural Science Foundation of China [51206067]
- Open Research Fund Program of Key Laboratory of Energy Thermal Conversion and Control of Ministry of Education (Southeast University)
- New Teacher Fund for the Doctoral Program of Higher Education of China [20123227120016]
- Key Laboratory of Efficient & Clean Energy Utilization
- Education Department of Hunan Province (Changsha University of Science Technology) [2014NGQ003]
- China Postdoctoral Science Foundation [2013M531281]
In this article, the effects of several process parameters (energy density per unit solution, H2O2 concentration, NaOH concentration, gas flow, solution temperature, NO concentration, O-2 concentration, SO2 concentration, Fe2+ concentration and t-butanol concentration) on removal of NO from flue gas by UV (Ultraviolet)/H2O2 advanced oxidation combining with NaOH absorption (UV/H2O2/NaOH process) were investigated in a photochemical reactor. The results indicate that under all experimental conditions, SO2 can be removed completely. Increasing H2O2 concentration, NaOH concentration, energy density per unit solution, t-butanol concentration and low concentration of Fe2+ have a significant role in promoting removal of NO. NO removal efficiency sharply reduces with the increase of gas flow, NO concentration and high concentration of Fe2+. NO removal is slightly inhibited by increasing solution temperature and SO2 concentration, but is slightly enhanced by increasing O-2 concentration. Oxidation of NO by (OH)-O-center dot free radicals plays an important role in the removal of NO by UV/H2O2/NaOH process. NO3- is the final reaction product of NO removal by UV/H2O2/NaOH process. The reaction mechanism of NO removal by UV/H2O2/NaOH process has also been proposed. (c) 2014 The Institution of Chemical Engineers. Published by Elsevier B.V. All rights reserved.
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