4.6 Article

Advanced oxidation removal of NO and SO2 from flue gas by using ultraviolet/H2O2/NaOH process

期刊

CHEMICAL ENGINEERING RESEARCH & DESIGN
卷 92, 期 10, 页码 1907-1914

出版社

ELSEVIER
DOI: 10.1016/j.cherd.2013.12.015

关键词

UV (Ultraviolet)/H2O2; Advanced oxidation; Flue gas; NO; SO2; NaOH

资金

  1. National Natural Science Foundation of China [51206067]
  2. Open Research Fund Program of Key Laboratory of Energy Thermal Conversion and Control of Ministry of Education (Southeast University)
  3. New Teacher Fund for the Doctoral Program of Higher Education of China [20123227120016]
  4. Key Laboratory of Efficient & Clean Energy Utilization
  5. Education Department of Hunan Province (Changsha University of Science Technology) [2014NGQ003]
  6. China Postdoctoral Science Foundation [2013M531281]

向作者/读者索取更多资源

In this article, the effects of several process parameters (energy density per unit solution, H2O2 concentration, NaOH concentration, gas flow, solution temperature, NO concentration, O-2 concentration, SO2 concentration, Fe2+ concentration and t-butanol concentration) on removal of NO from flue gas by UV (Ultraviolet)/H2O2 advanced oxidation combining with NaOH absorption (UV/H2O2/NaOH process) were investigated in a photochemical reactor. The results indicate that under all experimental conditions, SO2 can be removed completely. Increasing H2O2 concentration, NaOH concentration, energy density per unit solution, t-butanol concentration and low concentration of Fe2+ have a significant role in promoting removal of NO. NO removal efficiency sharply reduces with the increase of gas flow, NO concentration and high concentration of Fe2+. NO removal is slightly inhibited by increasing solution temperature and SO2 concentration, but is slightly enhanced by increasing O-2 concentration. Oxidation of NO by (OH)-O-center dot free radicals plays an important role in the removal of NO by UV/H2O2/NaOH process. NO3- is the final reaction product of NO removal by UV/H2O2/NaOH process. The reaction mechanism of NO removal by UV/H2O2/NaOH process has also been proposed. (c) 2014 The Institution of Chemical Engineers. Published by Elsevier B.V. All rights reserved.

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