期刊
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
卷 18, 期 5, 页码 2446-2451出版社
AMER INST PHYSICS
DOI: 10.1116/1.1288945
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The electron temperature and ion density produced by a microfabricated plasma generator are characterized in both argon gas and air. The plasma generator sustains a discharge by inductively coupling 450 MHz rf power into a small (10 mm diameter) vacuum chamber. The inductively coupled plasma source is surface micromachined on a glass wafer by electroplating a planar spiral inductor and two interdigitated capacitors. A plasma can be sustained using gas pressures between 0.1 and 10 Torr and rf powers between 0.3 and 3 W. The ion density increases from 10(10) to 10(11) cm(-3) over this range of power. The electron temperature decreases from 4 to 2 eV as the pressure increases from 0.1 to 1 Torr. (C) 2000 American Vacuum Society. [S0734-211X(00)01405-0].
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