期刊
IEEE TRANSACTIONS ON MAGNETICS
卷 36, 期 1, 页码 110-114出版社
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/20.824434
关键词
atomic force microscopy; electron spectroscopy for chemical analysis; thin films; X-ray reflectivity
We describe how the techniques of X-ray reflectivity (XRR), electron spectroscopy for chemical analysis (ESCA), and atomic force microscopy (AFM) can be used to obtain the structural parameters-thickness, coverage, and topography-of thin films used on magnetic recording disks. We focus on ultra-thin amorphous nitrogenated carbon (CNx) overcoats on disks. Each technique has its own strengths:,XRR measures film thickness absolutely, ESCA determines the chemical composition of the films, and AFM maps topography accurately. For the CNx overcoats investigated, we find incomplete coverage for thicknesses less than 20 Angstrom, and we find a small surface roughness with rms roughness less than or equal to 11 Angstrom.
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