期刊
ENVIRONMENTAL AND MOLECULAR MUTAGENESIS
卷 38, 期 2-3, 页码 97-104出版社
WILEY
DOI: 10.1002/em.1058
关键词
bacillus subtilis; DNA repair; spore photoproduct; spores; UV resistance
资金
- NATIONAL INSTITUTE OF GENERAL MEDICAL SCIENCES [R01GM019698, R37GM019698] Funding Source: NIH RePORTER
- NIGMS NIH HHS [GM19698] Funding Source: Medline
Dormant spores of the various Bacillus species, including B. subtilis, are 5 to 50 times more resistant to UV radiation than are the corresponding growing cells. This elevated spore UV resistance is due to: a) the photochemistry of DNA within spores, as UV generates few if any cyclobutane dimers, but rather a photoproduct (Fig. 1) called spore photoproduct (SP; 5-thyminyl-5,6-dihydrothymine); and b) DNA repair, in particular SP-specific repair, during spore germination. The novel UV photochemistry of spore DNA is largely due to its saturation with a group of small, acid-soluble proteins (SASP), which are unique to spores and whose binding alters the DNA conformation and thus its photochemistry. SP-specific repair is also unique to spores and is carried out by alight-independent SP-lyase, an iron-sulfur protein that utilizes S-adenosylmethionine to catalyze SP monomerization without DNA backbone cleavage. Environ. Mol. Mutagen. (C) 2001 Wiley-Liss, Inc.
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