期刊
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
卷 41, 期 1, 页码 312-313出版社
INST PURE APPLIED PHYSICS
DOI: 10.1143/JJAP.41.312
关键词
VO2 thin films; phase transition; RF magnetron sputtering; stress
The VO2 thin films were deposited on fused silica and soda-lime glass by RF magnetron sputtering and characterized by X-ray diffraction (XRD) and BIORAD FTS 6000 spectrometer. The influence of stress on the phase transition temperature and shape was also discussed.
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