期刊
IEEE TRANSACTIONS ON ELECTRON DEVICES
卷 49, 期 1, 页码 105-111出版社
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/16.974756
关键词
contact resistance; ohmic contacts; specific contact resistance
An analytical quasi-two-dimensional transmission line model (QTD-TLM) has been formulated to more accurately extract the specific contact resistance (p,) of ohmic contacts than the conventional one-dimensional TLM (1D-TLM). Similar to 1D-TLM, the extraction of p, using QTD-TLM is straightforward. By means of the conformal mapping technique, the two-dimensional (2-D) (or lateral) current flow and current crowding, owing to the presence of a gap between the TLM mesa and contacts, are jointly incorporated into our model using a single shunt resistor. QTD-TLM is generalized as it is applicable to a variety of contact dimensions and gap widths, and to both alloyed and nonalloyed contacts. The validity of QTD-TLM has been verified experimentally using two alloyed and two nonalloyed ohmic contacts, and by comparison with results from a 2-D numerical model.
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