期刊
CATALYSIS LETTERS
卷 80, 期 3-4, 页码 111-114出版社
KLUWER ACADEMIC/PLENUM PUBL
DOI: 10.1023/A:1015400223708
关键词
mesoporous thin film; reduction of CO2; photocatalyst; formation of CH3OH; quantum yield
Two different Ti-containing porous silica thin films having a hexagonal and cubic pore structure were synthesized and used as photocatalysts for the reduction of CO2 with H2O at 323 K. UV irradiation of the Ti-containing porous silica thin films in the presence of CO2 and H2O led to the formation of CH4 and CH3OH with a high quantum yield of 0.28%. These porous silica thin film photocatalysts having a hexagonal pore structure exhibited higher reactivity than the Ti-MCM-41 powder photocatalysts with the same pore structure.
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