TiO2 DLAR coatings for planar silicon solar cells

In this paper we demonstrate that a double-layer anti-reflection (DLAR) coating can be fabricated using only titanium dioxide (TiO2). Two TiO2 thin films were deposited onto planar silicon wafers using a simple atmospheric pressure chemical vapour deposition (APCVD) system under different deposition conditions. Weighted average reflectances of 6.5% (measured) and 7.0% (calculated) were achieved for TiO2 DLAR coatings in air and under glass, respectively. An increase in the short-circuit current density of Delta J(sc) = 2.5 mA/cm(2) can be expectedfor an optimised TiO2 DLAR coating when compared with a commercial TiO2 single-layer anti-reflection coating. Copyright (C) 2003 John Wiley Sons, Ltd.