期刊
SURFACE & COATINGS TECHNOLOGY
卷 162, 期 1, 页码 101-105出版社
ELSEVIER SCIENCE SA
DOI: 10.1016/S0257-8972(02)00576-5
关键词
germanium; electroplating; X-ray diffraction; infrared spectroscopy; atomic force microscopy; roughness
Germanium thin films electrochemically deposited at 300 K from a solution of GeCl4, in propylene glycol were investigated using X-ray diffraction (XRD), infrared (IR) spectroscopy and atomic force microscopy (AFM). XRD reveals that the germanium electrodeposits are of crystalline structure and have the preferred crystallographic growth orientation [220]. The presence of the hydrogen bonding in the germanium films such as Ge-H and Ge-H-2 is shown from the IR absorption and does not cause a phase transition from crystalline structures to amorphous structures. The AFM images exhibit anomalous surface roughening behaviors in growth that deviate from statistical surface growth models and indicate a transition from rough surfaces to smooth surfaces. (C) 2002 Elsevier Science B.V All rights reserved.
作者
我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。
推荐
暂无数据