期刊
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
卷 21, 期 6, 页码 2874-2877出版社
A V S AMER INST PHYSICS
DOI: 10.1116/1.1619958
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In this article we report on the fabrication of subwavelength antireflection structures on silicon substrates using a trilayer resist nanoimprint lithography and liftoff process. We have fabricated cone-shaped nanoscale silicon pillars with a continuous effective index gradient, which greatly enhances its antireflective performances. Our measurements show that the two-dimensional subwavelength structure effectively suppresses surface reflection over a wide spectral bandwidth and a large field of view. A reflectivity of 0.3% was measured at 632.8 nm wavelength, which is less than 1% of the flat silicon surface reflectivity. (C) 2003 American Vacuum Society.
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