期刊
PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS
卷 240, 期 2, 页码 429-432出版社
WILEY-V C H VERLAG GMBH
DOI: 10.1002/pssb.200303404
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InN films were grown on Si(111) substrates by RF-MBE, and an AIN buffer layer was inserted between Si substrates and a low-temperature InN buffer layer. The AIN buffer layer suppressed the formation of amorphous-like SiNx layer on the Si substrate surface, which led to the improvement of the crystallinity of the low-temperature InN buffer layer. High-quality InN films could then be realized on the low-temperature InN buffer layer with the AIN buffer layer inserted. The best value of the XRC-FWHM was 31.3 arcmin for InN films with a thickness of 300 nm. In addition, a surface reconstruction of InN was observed for the first time. (C) 2003 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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