期刊
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY
卷 17, 期 3, 页码 457-460出版社
TECHNICAL ASSOC PHOTOPOLYMERS,JAPAN
DOI: 10.2494/photopolymer.17.457
关键词
resist pattern; rinse water; Laplace force; meniscus; pattern collapse; adhesion; gravity
The drying process of the rinse water affects strongly to pattern collapse phenomena during development process. In order to analyze the water meniscus behavior, a PET film is used as a parallel line pattern. By using this transparent pattern, wetting behavior of water meniscus between two patterns can be observed. In the drying process of water meniscus, it is clearly observed that the meniscus enters from the side edge of the parallel pattern. The meniscus behavior can be analyzed based on capillary rise and gravity.
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