4.8 Article

Metal catalyst-free mist flow chemical vapor deposition growth of single-wall carbon nanotubes using C60 colloidal solutions

期刊

CARBON
卷 68, 期 -, 页码 80-86

出版社

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.carbon.2013.10.038

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资金

  1. MEXT of Japan [19084008, 22225001]
  2. Grants-in-Aid for Scientific Research [25107002, 22225001] Funding Source: KAKEN

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Metal catalyst-free mist flow chemical vapor deposition (CVD) growth of single-walled carbon nanotubes (SWCNTs) with C-60 fullerenes has been investigated by using an aqueous colloidal C-60 solution. Under the optimum reaction condition, relatively uniform SWCNTs with a mean diameter of 1.28 nm can be synthesized without any treatments of C-60 prior to CVD. Cap opening, nucleation and the growth of SWCNTs have been occurring almost simultaneously during the present CVD. C-60 can be used as the seeds (i.e., end-caps) of SWCNTs, in which oxygen atoms from water molecules provide etching of C-60 into caps. Furthermore, the coalescence of C-60 caps into a larger one leads to the growth of SWCNTs with larger diameters. (C) 2013 Elsevier Ltd. All rights reserved.

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