4.8 Article

Quantifying ion-induced defects and Raman relaxation length in graphene

期刊

CARBON
卷 48, 期 5, 页码 1592-1597

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PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.carbon.2009.12.057

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  1. Brazilian Agencies CNPq
  2. Brazilian Agencies CNPq, FINEP and FAPERJ
  3. American Agency AFOSR/SOARD [FA9550-08-1-0236]

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Raman scattering is used to study disorder in graphene subjected to low energy (90 eV) Ar' ion bombardment The evolution of the intensity ratio between the G band (1585 cm(-1)) and the disorder-induced D band (1345 cm(-1)) with ion dose is determined, providing a spectroscopy-based method to quantify the density of defects in graphene This evolution can be fitted by a phenomenological model, which is in conceptual agreement with a well-established amorphization. trajectory for graphitic materials Our results show that the broadly used Tuinstra-Koenig relation should be limited to the measure of crystallite sizes, and allows extraction of the Raman relaxation length for the disorder-induced Raman scattering process (C) 2010 Elsevier Ltd All rights reserved

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