期刊
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS
卷 44, 期 16-19, 页码 L539-L542出版社
JAPAN SOC APPLIED PHYSICS
DOI: 10.1143/JJAP.44.L539
关键词
X-ray; nanofocusing; focusing mirror; Kirkpatrick-Baez mirrors; diffraction limited focusing; plasma CVM; EEM; MSI; RADSI
Nanofocused X-ray beams are necessary for nanometer-scale spatial microscopy analysis. X-ray focusing using a Kirkpatrick-Baez setup with two total reflection mirrors is a promising method, allowing highly efficient and energy-tuneable focusing. In this paper, we report the development of ultraprecise mirror optics and the realization of a nanofocused hard-X-ray beam. Fabricated mirrors having a figure accuracy of 2 nm peak to valley height give ideal diffraction-limited focusing at the hard X-ray region. The focal size, defined as the full width at half maximum in the intensity profile, was 36 nm x 48 nm at an X-ray energy of 15 keV.
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