期刊
E-JOURNAL OF SURFACE SCIENCE AND NANOTECHNOLOGY
卷 4, 期 -, 页码 406-409出版社
SURFACE SCI SOC JAPAN
DOI: 10.1380/ejssnt.2006.406
关键词
Scanning Tunneling Microscopy; Te; Si(111)
资金
- Japan Society for the Promotion of Science [13GS0022]
The initial adsorption process of Te on Si(111) 7 x 7 surface at elevated temperatures was observed using STM. Te atoms form clusters. However the adsorption site changes with the substrate temperature. The oval clusters sits in between the faulted and unfaulted halves at around 300 degrees C, and the preferential adsorption at center adatoms is observed. The triangular clusters form on three adatoms in either the faulted or unfaulted halves without remarkable preference at around 500 degrees C.
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