3.8 Article

Replication of deep x-ray lithography fabricated microstructures through casting of soft material

出版社

SPIE-INT SOCIETY OPTICAL ENGINEERING
DOI: 10.1117/1.2176730

关键词

deep x-ray lithography; double casting; high aspect ratio; polydimethylsiloxane; polyvinyl alcohol

向作者/读者索取更多资源

We introduce simple double-casting replication methods for high-aspect-ratio microstructures fabricated by deep x-ray lithography using intermediate molds of soft materials. Two types of soft material are investigated. The ability to fabricate polymethylsiloxane (PDMS) molds with well-type structures with aspect ratios up to 35: 1 is demonstrated for structure densities below 50%, and the reproduction from this mold of pillar-type polymethyl methacrylate (PMMA) structures with aspect ratios of 20: 1 is achieved. Polyvinyl alcohol (PVA), a water soluble polymer, is also tested as a sacrificial intermediate mold and successfully used for the replication of structures with aspect ratios up to 5:1. Double-casting replication methods are described and discussed for their potential improvement. (c) 2006 Society of Photo-Optical Instrumentation Engineers.

作者

我是这篇论文的作者
点击您的名字以认领此论文并将其添加到您的个人资料中。

评论

主要评分

3.8
评分不足

次要评分

新颖性
-
重要性
-
科学严谨性
-
评价这篇论文

推荐

暂无数据
暂无数据