A modified cellular automata algorithm for the simulation of boundary advancement in deposition topography simulation

This paper presents a two-dimensional (2D) modified cellular automata (CA) algorithm for accurate boundary movement of deposition process simulation. The algorithm incorporates deposition rate calculation methods based on a cell structure. Isotropic and anisotropic deposition processes were successfully simulated by the algorithm, and the simulation profiles show good agreement with available experimental results. The deposition process with defects on the substrate was also implemented using this algorithm. The 2D modified CA algorithm demonstrates accuracy and capability of handling complex boundary and initial conditions. It is useful for the deposition process simulation of microelectromechanical systems and integrated circuits.