期刊
FERROELECTRICS
卷 353, 期 -, 页码 566-571出版社
TAYLOR & FRANCIS LTD
DOI: 10.1080/00150190701368083
关键词
ferroelectric thin films; sputter deposition; X-ray photoelectron spectroscopy
In this work, the chemical composition profile near the stuface of Pb(ZrTi)O-3 thin films which were deposited by large-area multi-target reactive sputtering was investigated by nondestructive angle-resolved X-ray photoelectron spectroscopy. We obtained a lead depleted stuface layer with an increased ZrI(Zr+Ti) ratio compared to the film bulk. The presence of this damaged surface layer was attributed to ion bombardment from the low-pressure plasma at the sputter target. This stuface layer was found to absorb oxygen and moisturefirom the environment.
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