Runout of the Socompa volcanic debris avalanche, Chile: a mechanical explanation for low basal shear resistance

We propose a mechanical explanation for the low basal shear resistance (about 50 kPa) previously used to simulate successfully the complex, well-documented deposit morphology and lithological distribution produced by emplacement of the 25 km(3) Socompa volcanic debris avalanche deposit, Chile. Stratigraphic evidence for intense basal comminution indicates the occurrence of dynamic rock fragmentation in the basal region of this large granular mass flow, and we show that such fragmentation generates a basal shear stress, retarding motion of the avalanche, that is a function of the flow thickness and intact rock strength. The topography of the Socompa deposit is realistically simulated using this fragmentation-derived resistance function. Basal fragmentation is also compatible with the evidence from the deposit that reflection of the avalanche from topography caused a secondary wave that interacted with the primary flow.