4.4 Article Proceedings Paper

Effect of hydrogen during growth of quantum barriers on the properties of InGaN quantum wells

期刊

JOURNAL OF CRYSTAL GROWTH
卷 414, 期 -, 页码 38-41

出版社

ELSEVIER SCIENCE BV
DOI: 10.1016/j.jcrysgro.2014.09.037

关键词

X-ray diffraction; Atomic force microscopy; Low press. metalorganic vapor phase epitaxy; Nitrides; Semiconducting ternary compounds

资金

  1. VII Framework program NEWLED
  2. Polish National Agency of Research and Development, National Science Centre (NCN) [99531]

向作者/读者索取更多资源

InGaN/GaN multiple quantum well structures were grown on bulk GaN and on sapphire substrates using the metalorganic vapor-phase epitaxy in order to study the influence of hydrogen during the growth of the GaN barriers. This hydrogen flow had the following effects on the structures: (i) the thickness of the QWs was reduced, (ii) the indium concentration in the QWs was decreased and (in) the growth rate of the quantum barriers was increased. (C) 2014 Elsevier B.V. All rights reserved.

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