4.8 Article

Automatically Acquired Broadband Plasmonic-Metamaterial Black Absorber during the Metallic Film-Formation

期刊

ACS APPLIED MATERIALS & INTERFACES
卷 7, 期 8, 页码 4962-4968

出版社

AMER CHEMICAL SOC
DOI: 10.1021/acsami.5b00056

关键词

particle plasmon resonances; plasmon near-field coupling; plasmonic-metamaterial asorber; metal film formation; deposition

资金

  1. National Natural Science Foundation of China [11464019, 11264017, 11304159]
  2. Natural Science Foundation of Jiangxi Province [20142BAB212001]
  3. Young Scientist Development Program of Jiangxi Province [20142BCB23008]
  4. Jiangxi Provincial Education Department [GJJ14253]
  5. Jiangxi Normal University [6047, 5460]

向作者/读者索取更多资源

Broadband electromagnetic wave absorbers are highly desirable in numerous applications such as solar-energy harvesting, thermo-photovoltaics, and photon detection. The aim to efficiently achieve ultrathin broadband absorbers with high-yield and low-cost fabrication process has long been pursued. Here, we theoretically propose and experimentally demonstrate a unique broadband plasmonic-metamaterial absorber by utilizing a sub-10 nm meta-surface film structure to replace the precisely designed metamaterial crystal in the common metal-dielectric-metal absorbers. The unique ultrathin meta-surface can be automatically obtained during the metal film formation process. Spectral bandwidth with absorbance above 80% is up to 396 nm, where the full absorption width at half-maximum is about 92%. The average value of absorbance across the whole spectral range of 370-880 nm reaches 83%. These super absorption properties can be attributed to the particle plasmon resonances and plasmon near-field coupling by the automatically formed metallic nanoparticles as well as the plasmon polaritons of the metal film with the induced plasmonic magnetic resonances occurring between the top meta-surface and the bottom metal mirror. This method is quite simple, cost-effective for large-area fabrication, and compatible with current industrial methods for microelectro-mechanical systems, which makes it an outstanding candidate for advanced high-efficiency absorber materials.

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