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Recent advances in low-temperature solution-processed oxide backplanes

期刊

JOURNAL OF INFORMATION DISPLAY
卷 14, 期 2, 页码 79-87

出版社

TAYLOR & FRANCIS LTD
DOI: 10.1080/15980316.2013.806274

关键词

low-temperature process; metal-oxide semiconductor; solution-processed oxide; thin-film transistor

资金

  1. Industrial Strategic Technology Development Program - Ministry of Knowledge Economy (MKE, Korea) [10041808]

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Applicable flexible electronics, particularly flexible displays, have been developed for next-generation devices in recent years. Sol-gel processing, for example, which uses low-temperature annealing, is a promising technique. This review article focuses on recent advances in achieving low-temperature, solution-processed oxide thin-film transistors (TFTs) through chemical and physical approaches. First, chemical approaches were overviewed in terms of solute and solvent engineering. Second, physical approaches were summarized that some researchers added energy resources except heat on the conventional sol-gel process. The additional energy sources involve microwave annealing, high-pressure annealing, and ultraviolet irradiation. This review article offers an overview of these techniques introduced in details. From these efforts, metal-oxide TFTs can be fabricated at 150 degrees C maintaining their device performance.

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