期刊
THEORETICAL AND APPLIED MECHANICS LETTERS
卷 10, 期 1, 页码 23-26出版社
ELSEVIER
DOI: 10.1016/j.taml.2020.01.001
关键词
Piezoresponse force microscopy; Electrostatic interactions; Capacitive excitation
类别
资金
- National Key Research and Development Program of China [2016YFA0201001]
- National Natural Science Foundation of China [11372268, 11627801, 1472236]
- Unite State National Science Foundation [CBET-1435968]
- Leading Talents Program of Guangdong Province [2016LJ06C372]
- Shenzhen Science and Technology Innovation Committee [KQJSCX20170331162214306]
Piezoresponse force microscopy (PFM) has emerged as one of the most powerful techniques to probe ferroelectric materials at the nanoscale, yet it has been increasingly recognized that piezoresponse measured by PFM is often influenced by electrostatic interactions. In this letter, we report a capacitive excitation PFM (ce-PFM) to minimize the electrostatic interactions. The effectiveness of ce-PFM in minimizing electrostatic interactions is demonstrated by comparing the piezoresponse and the effective piezoelectric coefficient measured by ce-PFM and conventional PFM. The effectiveness is further confirmed through the ferroelectric domain pattern imaged via ce-PFM and conventional PFM in vertical modes, with the corresponding domain contrast obtained by ce-PFM is sharper than conventional PFM. These results demonstrate ce-PFM as an effective tool to minimize the interference from electrostatic interactions and to image ferroelectric domain pattern, and it can be easily implemented in conventional atomic force microscope (AFM) setup to probe true piezoelectricity at the nanoscale. (C) 2020 The Authors. Published by Elsevier Ltd on behalf of The Chinese Society of Theoretical and Applied Mechanics.
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