期刊
MEDICAL & BIOLOGICAL ENGINEERING & COMPUTING
卷 38, 期 2, 页码 175-179出版社
SPRINGER HEIDELBERG
DOI: 10.1007/BF02344773
关键词
microelectrodes; neurophysiology; silicon-micromachining; neurotechnology
A process is described for the fabrication of silicon-based microelectrodes for neurophysiology using bonded and etched-back silicon-on-insulator (BESOI) wafers. The probe shapes are defined without high levels of boron doping in the silicon; this is considered as a step towards producing probes with active electronics integrated directly beneath the electrodes. Gold electrodes, of 4 mu m by 4 mu m to 50 mu m by 50 mu m are fabricated on shanks (cantilever beams) 6 mu m thick and which taper to an area approximately 100 mu m wide and 200 mu m long, which are inserted into the tissue under investigation, The passive probes fabricated have been successfully employed to make acute recordings from locust peripheral nerve.
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