期刊
APPLIED PHYSICS LETTERS
卷 76, 期 14, 页码 1926-1928出版社
AMER INST PHYSICS
DOI: 10.1063/1.126214
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Dielectric properties of ultrathin hafnium oxide reoxidized with rapid thermal annealing (RTA) have been investigated. Capacitance equivalent oxide thickness (CET) of 45 Angstrom hafnium oxide was scaled down to similar to 10 A with a leakage current less than 3 x 10(-2) A/cm(2) at -1.5 V (i.e., similar to 2 V below V-FB). Leakage current increase due to crystallization was not observed even after 900 degrees C rapid thermal annealing (RTA), but CET did increase after high temperature RTA due to the interfacial layer growth and possible silicate formation in the HfO2 film. (C) 2000 American Institute of Physics. [S0003-6951(00)04414-4].
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