期刊
CHEMICAL PHYSICS LETTERS
卷 320, 期 3-4, 页码 339-344出版社
ELSEVIER SCIENCE BV
DOI: 10.1016/S0009-2614(00)00250-5
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Spatial concentration and temperature profiles of the CH radical in a hot-filament chemical vapor deposition reactor are measured by cavity ring-down spectroscopy. The CH concentration is found to be on the order of 10(11) molecules/cm(3). The spatial distribution indicates that CH formation primarily occurs at or very near the filament. At a distance of 2 mm from the filament the [H]/[H-2] ratio is determined to be 0.011 +/- 0.003. (C) 2000 Elsevier Science B.V. All rights reserved.
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